Optical and X-ray microlithography at the turn of the century
I. A. Artyukov P. N. Lebedev Physical Institute of the Russian Academy of Sciences, Moscow Abstract: The paper reviews the development of optical lithography based on excimer laser and soft X-ray projection lithography at the end of the 20th century and at the beginning of the 21th century. The contribution of N.G. Basov and his… Read More »